ASML showcases the performance of the EUV High-NA chip manufacturing machine by successfully reaching an 8nm circuit level, after previously demonstrating a 10nm circuit destruction in April.
The original EUV chip manufacturing machine could achieve a critical dimension (CD) of 13.5nm, while the High-NA machine can now reach 8nm, providing a significant advantage for manufacturers equipped with High-NA machines.
While we often hear about chip manufacturing technology at 5nm or 3nm, these numbers signify the size of the circuits on silicon wafers. For instance, a 3nm technology may have a pitch size of 24nm. Chip manufacturers typically introduce new production lines when the chip efficiency differs significantly from the previous models, creating a product line cut-off and differing chip sizes per company.
In addition to successfully shrinking circuit sizes, ASML also presents a post-2033 roadmap for developing Hyper-NA technology. The original EUV machine production line also continues to evolve.
Source: Tom’s Hardware
TLDR: ASML achieves success in reducing circuit sizes with the EUV High-NA machine, now capable of reaching an 8nm circuit level, with plans for further technological advancements in Hyper-NA beyond 2033.
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