Fujio Mitarai, the CEO of Canon, recently revealed that the chip manufacturing machinery utilizing the Nano-imprint technology developed by the company will have a more affordable price compared to ASML’s EUV (extreme ultraviolet lithography) technology, by a significant percentage. However, Canon has yet to officially announce the price of this machinery.
The operation of the Nano-imprint machinery involves directly projecting patterns onto the wafer. This method differs from the EUV technology. Canon has been collaborating with Dai Nippon Printing and Kioxia Holdings to develop this technology for nearly 10 years now.
It is expected that Canon’s machinery will become a viable choice for medium to small semiconductor factories, as it will help reduce the production cost of high-resolution chips. Previously, this technology was only accessible to large-scale semiconductor factories with substantial capital. CEO Mitarai believes that while Nano-imprint may not entirely replace EUV, it does offer an opportunity for medium to small chip factories to access new manufacturing tools.
TLDR: Canon’s CEO, Fujio Mitarai, announced that their chip manufacturing machinery utilizing the Nano-imprint technology will have a lower price compared to ASML’s EUV technology, making it a viable option for medium to small semiconductor factories. This technology allows for the direct projection of patterns onto the wafer and has been developed in collaboration with Dai Nippon Printing and Kioxia Holdings for almost a decade. While it may not replace EUV entirely, Nano-imprint provides an opportunity for smaller chip factories to access new manufacturing tools.