Intel Foundry, the chip manufacturing unit of Intel, has announced a significant milestone in the installation of EUV chip production equipment with High-NA (Numerical Aperture) at their research and development facility in Hillsboro, Oregon.
The High-NA EUV machine, manufactured by ASML under the model TWINSCAN EXE:5000, marks Intel as the first customer to receive the equipment at the end of last year.
Intel stated that the High-NA EUV machine will enable printing of smaller circuits up to 1.7 times that of the current EUV machines, resulting in a 2.9 times increase in 2D circuit density. Intel plans to utilize this technology in the production of Intel 18A chips (equivalent to 2 nanometers of TSMC) by 2025 and in the production of Intel 14A chips (1.4 nanometers) thereafter.
Source: Intel
**TLDR: Intel Foundry implements cutting-edge High-NA EUV chip production equipment to enhance circuit density and advance chip production technology.**
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