At GTC 2024, TSMC and Synopsys have announced the adoption of NVIDIA cuLitho library in chip manufacturing process. This technology, introduced by NVIDIA last year, is expected to reduce chip design time and significantly save energy during the design process.
cuLitho aids in designing green prints for extremely small chip technologies, mitigating errors caused by light bending and necessitating calculations for correction, known as optical proximity correction (OPC) or inverse lithography technology (ILT). However, this process demands high computational power. Currently, software runs on 40,000 CPUs, but with cuLitho, OPC can be performed with just 350 H100 chips, boosting efficiency.
Synopsys has started delivering Proteus software, running cuLitho, to TSMC. OPC processing is a bottleneck in high-end chip design, and accelerating it will pave the way for faster development of advanced technology chips in the future.
TLDR: GTC 2024 showcased TSMC and Synopsys leveraging NVIDIA’s cuLitho library to enhance chip manufacturing processes, aiming to reduce design time and energy consumption while advancing high-end chip technology development.
Leave a Comment